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ORLANDO, Fla.--(BUSINESS WIRE)--Jan. 17, 2006--psiloQuest, Inc.
is pleased to announce the
commercial launch of the W ProPad(TM) CMP polishing pad specifically
developed for the most
demanding tungsten CMP applications. W ProPad(TM) is the first
commercially released product in the
ProPad(TM) family of CMP polishing pads from psiloQuest.
The W ProPad(TM) is the culmination of 5 years of development
effort focused on achieving a
consistent, novel pad technology that does not require external
pad conditioning. Proven wafer-level
benefits include low defectivity, low erosion, and excellent
within-wafer non-uniformity using standard
carrier designs. Substantial improvements are also realized in
excellent overpolish margin, lower slurry
consumption, and long pad life.
Dan Marks, President and CEO of
psiloQuest, added, "We
are thrilled to announce the launch of the
first offering from the ProPad(TM) family of CMP pad products.
Customer feedback continues to
validate our approach of improving the technical performance
of the polishing pad while
simultaneously simplifying its use." The W ProPad(TM) is
the commercial release designation of the
beta-release product formerly ASP-3870. It is immediately available
for most production rotational
polisher configurations.
psiloQuest, Inc. was established in Orlando, FL during 2000 to
develop and commercialize CMP
polishing pads for the semiconductor industry. Initial product
development and commercialization
efforts took 2.5 years, and the company began commercial operations
in April 2003. psiloQuest has
distribution facilities in Korea, Taiwan, Singapore and Europe
as well as distribution capabilities
throughout North America. For more information, contact psiloQuest
at 888-CMP-PADS orSales@psiloQuest.com
Contacts
psiloQuest, Inc., Orlando
Dan Marks, 321-235-0192, 321-235-0197 Fax
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